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Ion Implantation is a process used in the semiconductor industry to modify the electrical properties of a material. It involves the introduction of ions into a material, usually a semiconductor, to create a desired electrical effect. The ions are typically accelerated to high energies and implanted into the material. The implanted ions can modify the electrical properties of the material, such as its conductivity, resistivity, and breakdown voltage. Ion implantation is used in the fabrication of semiconductor devices, such as transistors, diodes, and integrated circuits. It is also used to create shallow junctions, which are used in the fabrication of microelectronic devices.
Ion implantation is a critical step in the semiconductor fabrication process, as it allows for the precise control of the electrical properties of the material. It is also used to create shallow junctions, which are used in the fabrication of microelectronic devices.
Some companies in the Ion Implantation market include Applied Materials, ASM International, Axcelis Technologies, Lam Research, and Tokyo Electron. Show Less Read more